...

DFA Labs


Fill out the form with the requested information and select the equipment you want to be authorized for.





Upload the certificate of attendance of the safety course for high-risk activities: (*)

First name (*)
The First name field is mandatory.
Last name (*)
The Last name field is mandatory.
Tax ID code (*)
The Tax ID code field is mandatory.
Email address (*)
The Email address field is mandatory.
Badge number (*)
The Badge number field is mandatory.
Expiration date (*)
The Expiration date field is mandatory.

(*) Required fields

Select from the list of laboratory equipment and the corresponding activity managers (RDRL):


LAB 013: Chemistry Lab 1


 Equipment for chemistry lab (no HF) (T. Cesca)

LAB 015: Preparation Lab


 Fume hood for solvents (C. Sada)

LAB 016: Laser Processing Lab


 Excimer laser (E. Napolitani)

 Stylus mechanical profilometer, KLA-Tencor P17 (E. Napolitani)

LAB 017: Ultrafast Spectroscoy Lab


 Femtosec. laser and optical parametric ampl. (T. Cesca)

 HBT system (T. Cesca)

 Fourier transform microscopy set-up (T. Cesca)

LAB 018: Single-photon microscopy Lab


 Single-photon microscope (T. Cesca)

LAB 019: Luminescence and non-Linear Optics Lab


 Luminescence set-up (T. Cesca)

 Picosecond laser and optical parametric amplifier (T. Cesca)

LAB 020: Optics Lab


 Optics set-ups (DA DEFINIRE) (C. Sada)

LAB 022: S.I.M.S. - Secondary Ions Mass Spectrometry Lab


 Secondary ion mass spectrometer, CAMECA IMS-4f (E. Napolitani)

 Stylus mechanical profilometer, KLA-Tencor P17 (E. Napolitani)

 Van der Pauw-Hall measurement system, MMR technologies (E. Napolitani)

LAB 023: Atmosferic Plasma Treatment Lab


 Atmosferic plasma treatment system (A. Patelli)

LAB 032: Thermal Treatment sand Depositions Lab


 Sputtering (T. Cesca)

 Carbolite oven (T. Cesca)

 Evaporator (G. Mattei)

 Reactive Ion Etching (G. Mattei)

 Atomic Layer Deposition (ALD) (C. Maurizio)

 Gero oven (C. Sada)

 Gero-Carbolite oven (C. Sada)

LAB 033: Physical Depositions Cluster Lab


 Integrated system for sputtering and electron-beam evaporation (E. Napolitani)

LAB 034: Photocatatalysis Lab


 Equipment for photocatalysis (DA DEFINIRE) (C. Maurizio)

LAB 035: Chemistry Lab 2


 Equipment for chemistry lab (with HF) (M. Pierno)

LAB 060: Solid State Detectors Lab


 Laser writer (D. De Salvador)

 X-ray diffraction system (P. Giubilato)

 Clean room (P. Giubilato)

LAB 066: Mechanical Workshop


 Equipment for mechanical workshops (G. Mistura)

LAB 068: Nano-optics Lab


 Optical bench (DA DEFINIRE) (M. Merano)

LAB 069: MiM Lab


 Micromilling (M. Pierno)

 Czocralski oven (C. Sada)

LAB 072: Disordered Systems Lab


 Optical benches (DA DEFINIRE) (G. Monaco)

LAB 073: SEM Scanning Electron Microscopy Lab


 Scanning electron microscope (SEM) (G. Mattei)

LAB 074: Surface and Interfaces Lab


 Inverted optical microscope (M. Pierno)

 Static and dynamic contact angle measurement system (M. Pierno)

LAB 078: Neurophotonics and Biophotonics Lab


 DA DEFINIRE (F. Pisano)

LAB 079: M.A.N.O. (Microfluidics, Adsorption, Nanofriction and Optics) Lab


 da definire (G. Mistura)

LAB 080: BioLab


 Class II biohazard hood, incubator, centrifuges, -80C ultrafreezer (D. Ferraro)

LAB 082: Force microscopy Lab


 Optical Tweezer (A. Zaltron)

 Atomic force microscope (E. Di Russo)

LAB 086: Spectroscopy Lab


 Atomic force microscope, AFM (NT-MDT) (T. Cesca)

 Spectrophotometer UV-VIS-NIR (JASCO V670) (T. Cesca)

 Spectrofluorimeter (Fluoromax, Horiba) (T. Cesca)

 Raman microscope (A. Patelli)

 Spectrometer FT-IR (A. Patelli)

LAB 994: Test n.01


 Strumento n.01 (RdRL Test)

 Strumento n.02 (RdRL Test)

LAB 995: Test n.02


 Strumento n.06 (RdRL Test)

LAB 996: Test n.03


 Strumento n.03 (RdRL Test)temporarily unavailable

LAB 997: Test n. 04


 Strumento n.04 (RdRL Test)

LAB 998: Test n. 05


 Strumento n.05 (RdRL Test)temporarily unavailable

LAB 999: XRD Lab


 X-ray diffractometer (D. De Salvador)